Reaction sintered silicon carbide cantilever slurry is a key component of semiconductor wafer loading system. Silicon carbide paddles used in the photovoltaic new energy industry, with main specifications of 237825502660, 3560, 3580, 3750 millimeters, etc., are applied in diffusion furnaces for the (diffusion) coating process of polycrystalline silicon wafers or monocrystalline silicon wafers, and play a role in carrying and transporting silicon wafers in high temperature environments (1000-1300 ℃).
Cantilever slurry has stable performance, does not deform in high temperature environments, has high wafer loading force, and is suitable for robot automatic loading and handling systems. Due to the stable and non deformable cross-section of the cantilever slurry, it is possible to prepare larger sized wafers using existing furnace tubes. The thermal expansion coefficients of cantilever slurry and LPCVD coating are similar, and their application in LPCVD greatly extends the maintenance and cleaning cycle and significantly reduces pollutants。